首页|Optical and structural characterization of high crystalline beta-Ga2O3 films prepared using an RF magnetron sputtering
Optical and structural characterization of high crystalline beta-Ga2O3 films prepared using an RF magnetron sputtering
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NSTL
Elsevier
beta-Ga2O3 films have been prepared on sapphire (0001) substrate using an RF magnetron sputtering. The highly oriented beta-Ga2O3 films with a high crystallinity could be obtained at Ts above 700 degrees C. The sputtered film in pure Ar showed a low optical band-gap and a strong optical absorption in UV and visible region, possibly due to non-stoichiometry, oxygen-deficiency. Raman modes of beta-Ga2O3 started to evolve at Ts of 400 degrees C and then, were clearly defined and dominant at Ts above 600 degrees C in a good consistence with XRD result. In the PL spectra at Ts above 600 degrees C, UV emission peaked at 3.75 eV and red-emission composed of broad band and sharp peaks were predominant. These emissions are the first report in PL spectra of beta-Ga2O3 and have been tentatively assigned to high energy excitons caused by electrons trapped with holes at deeper acceptor level, and optical transition between deep donor level and delocalized/clustered acceptor levels, respectively. (C) 2021 Elsevier B.V. All rights reserved.
NSTL
Elsevier
