首页|Effect of O-2/Ar flow ratio and heat treatment on the structure and properties of SiO2 film prepared by magnetron sputtering
Effect of O-2/Ar flow ratio and heat treatment on the structure and properties of SiO2 film prepared by magnetron sputtering
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NSTL
Elsevier
SiO2 thin film was deposited on quartz glass substrate with radio frequency (RF) magnetron sputtering. The effects of O2/Ar flow ratio and heat treatment on the O/Si molar ratio, surface morphology and optical properties of the film were investigated. SiO2 film was composed of amorphous nanoparticles. When the O2/Ar flow ratio increased from 30% to 60%, the film's O/Si ratio increased continuously from severe O-deficiency 1.68:1 to 1.93:1, close to the stoichiometric ratio 2:1. Meanwhile, the particles' average size decreased and became more uniform, and the surface roughness decreased with the O2/Ar flow ratio increase. And the film's refractive index and absorptivity decreased continuously, while the coated glass substrate's average transmittance (hereinafter referred to as the film's transmittance) within 300-1100 nm increased from 91.7% to 92.9% continuously. Heat treatment at 550 degrees C resulted in an obvious agglomeration of the nanoparticles, reduced the refractive index of the film and improved its transmittance.
NSTL
Elsevier
