Abstract
? 2022 Elsevier B.V.A high-throughput technique can realize fast and efficient material screening, and greatly improve the discovery efficiency of advanced materials. In the present work, the gradient composition films of the W-Ta-CrFeNi high-entropy alloy were prepared by the three-target magnetron co-sputtering technique. The gradient alloy films exhibited a body-center-cubic (BCC) structure near the W or Ta element target, and an amorphous structure near the CrFeNi target region. Considering the effect of the undercooling degree, the amorphous formation region (using Ω ~ δ) was larger than that of the bulk alloys. These alloy films displayed ultra-high nano-indentation hardness, with the maximum hardness reaching ~ 20.6 GPa. The elastic modulus in the high-entropy composition region was lower than that in the low-entropy composition region. There is a nonlinear relationship between the nano-indentation hardness and mix-entropy of the alloys. This study provides a reference and alternative material library for the development of high-performance advanced materials.
NSTL
Elsevier