首页|Synthesis of high-surface area tungstated zirconia by atomic layer deposition on mesoporous silica
Synthesis of high-surface area tungstated zirconia by atomic layer deposition on mesoporous silica
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Atomic layer deposition (AID) was used to prepare ZrO2 films on the surface of the mesoporous silica, SBA-15, and to modify the surface of these films with WO3 in order to form tungstated zirconia. Adsorption-desorption isotherms, pore size distributions, and transmission electron microscopy demonstrated that the AID synthesis produced zirconia films that were conformal to the SBA-15 pores. DRIFT spectroscopy of pyridine adsorbed on the tungstated-zirconia SBA-15 samples showed adsorbed pyridinium ions, confirming the presence of Br0nsted-acid sites on this material, consistent with what has been reported for bulk tungstated zirconia. The ALD-synthesized, tungstated-zirconia SBA-15 was also shown to be active in the acid-catalyzed H-D exchange between toluene and D2O.
Atomic layer deposition (ALD)Mesoporous materialSolid acid catalysisBr0nsted acid site
Ching-Yu Wang、Ohhun Kwon、Raymond J. Gorte
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Department of Chemical and Biomolecular Engineering, University of Pennsylvania, Philadelphia, PA, 19104, USA
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