首页|Ultra-narrow and ultra-strong nanojet for nanopatterning and nanolithography
Ultra-narrow and ultra-strong nanojet for nanopatterning and nanolithography
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NSTL
Elsevier
A numerical study has been performed on electric field profile features of photonic nanojet generated by a SiO2 microcylinder with a varied diameter. The study shows that a strong (44.2I(0)) nanojet with 0.7 lambda lateral width and 7.8 lambda length can be obtained, which, as a line light source, has a potential for application in fields of nanopatterning and nanolithography. Along with the study on a single-layer microcylinder, we further studied the characteristics of the nanojet generated by a two-layer microsphere consisted of an interior LiNbO3 microsphere and an exterior semiconductor layer, which have refractive indices of 2.34 and similar to 3.3 @ 500 nm, respectively. The study focuses on nanojet generation condition and the effects of refractive indices of microsphere materials and background, and working wavelength on electric field distribution characteristics of the nanojet. By immersing the two-layer microsphere into a proper liquid such as the deionized water, an ultra-long (>14 lambda), ultra-strong (>50I(0)) and narrow enough (0.56 lambda) nanojet could be created. All of the characteristics and effects are qualitatively interpreted in terms of ray optics in combination with Mie scattering theory.
NSTL
Elsevier
