首页|Recent applications of continuous flow chemical vapor and hydride generation (CVG, HG) coupled to plasma-based optical emission spectrometry (ICP OES, MIP OES)

Recent applications of continuous flow chemical vapor and hydride generation (CVG, HG) coupled to plasma-based optical emission spectrometry (ICP OES, MIP OES)

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  • NSTL
  • Elsevier
Chemical vapor or hydride generation (CVG/HG) still plays a significant role in continuous flow sample introduction system. The development and higher accessibility of new commercial CVG/HG accessories (especially modified spray chambers and nebulizers) improves the analytical possibilities of plasma-based optical emission spectrometry for determination of hydride forming analytes. These systems are still designed and widely applied despite the better availability of its alternatives. The commercialization of the first nitrogen microwave induced plasma optical emission spectrometry instrument (MIP OES) also contributes to the increase in popularity of these solutions. The latest achievements in commercial and laboratory-made generators and instruments, as well as new strategies in sample preparation for total content and speciation analysis, are discussed in the review.

Chemical vaporHydride generationInductively coupled plasmaMicrowave induced plasmaOptical emission spectrometrySAMPLE INTRODUCTION SYSTEMATOMIC-EMISSIONMASS-SPECTROMETRYMICROWAVE PLASMASE HYDRIDESCOLD-VAPORULTRASONIC NEBULIZATIONLIQUID-CHROMATOGRAPHYFORMING ELEMENTSZN ELEMENTS

Proch, Jedrzej、Niedzielski, Przemyslaw

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Adam Mickiewicz Univ

2022

10.1016/j.talanta.2022.123372

Talanta

Talanta

EISCI
ISSN：0039-9140
年,卷(期)：2022.243
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