首页|On the thermal stability and oxidation resistance of Zr/X-(Cr,X- Ni,X- Si) multilayer structure
On the thermal stability and oxidation resistance of Zr/X-(Cr,X- Ni,X- Si) multilayer structure
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NSTL
Elsevier
The application of multilayer coatings in the field of nuclear-grade zirconium alloy protection has attracted much attention. However, the phenomenon of element diffusion between layers at high temperature has not been systematically studied. In this work, by selecting specific elements X (Cr, Ni, Si), the stability and oxygen barrier properties of the multilayer film coupled with Zr layer were investigated. The key characteristic indicators were clarified, including grain boundary effect, oxygen diffusion coefficient and Zr/X inter-diffusion ability. Zr/Si multilayer system outstripped others with excellent oxidation resistance, and only the surface Zr layer was completely oxidized at both 400 degrees C and 700 degrees C in air. At hot steam environment of 400 degrees C/10.3 MPa, the formation of a thin amorphous Zr-Si-O layer and an amorphous silicon oxide layer guarantee good oxygen barrier effect and greatly reduce the oxygen partial pressure at oxidation front.
NSTL
Elsevier
