首页|NOVEL PZT CAPACITOR TECHNOLOGY FOR 1.6 V FRAM EMBEDDED SMARTCARD

NOVEL PZT CAPACITOR TECHNOLOGY FOR 1.6 V FRAM EMBEDDED SMARTCARD

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In this study we present an MOCVD-PZT-based 1.6 V operational 1T1C COB FRAM for embedded smart card applications. The extension of FRAM operation to low voltage requires reduction of PZT thickness to 100 nm which is accompanied by a degradation of saturation polarization as well as reliability properties. It will be shown that the application of a seeding layer offers a solution to the reliability problem. The sensing margin of the device is enhanced by a careful optimization of the Ti/(Zr+Ti) ratio of the PZT film.

FRAMembeddedsmart card1T1CCOBPZTPTO seeding layerMOCVD

H. S. RHIE、H. J. JOO、S. K. RANG

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Technology Development Team 2, Memory Division, Semiconductor Business, Samsung Electronics Co. Ltd., San #24, Nongseo-Ri, Giheung-Eup, Yongin-City, Gyeonggi-Do, Korea

sd.maff.gsi.gov.uk

2006

Integrated Ferroelectrics

Integrated Ferroelectrics

EIISTP
ISSN:1058-4587
年,卷(期):2006.81(1)