首页|Magnetocrystalline anisotropy of epitaxially grown FeRh/MgO(001) films

Magnetocrystalline anisotropy of epitaxially grown FeRh/MgO(001) films

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  • NSTL
  • Elsevier
? 2022 Elsevier B.V.We quantitatively investigated the magnetocrystalline anisotropy (MCA) of metamagnetic FeRh films epitaxially grown on MgO(001) substrates. The in-plane fourfold magnetic anisotropy of epitaxial FeRh films is reoriented from the<100>to<110>directions and meanwhile the strength is obvious enhanced when FeRh transfers from the ferromagnetic (FM) to antiferromagnetic (AF) states. In the nominal AF state, the observed fourfold magnetic anisotropy originates from the exchange coupling between the residual FM moments caused by antisite defects and the AF matrix, which therefore indicates the orientation and strength of the MCA of AF FeRh. The steep increase of the FM resonance linewidth when crossing the FM-AF phase transition temperature reveals the enhanced effective magnetic damping and an increased fourfold anisotropic two-magnon scattering. The first-principles calculations suggest that the in-plane lattice compressive strain imposed by the MgO substrate plays an important role in determining the magnetic structures FeRh films.

Epitaxial filmFeRhMagnetic structureMagnetocrystalline anisotropyPhase transition

Zhu X.、Qiu Q.、Cao C.、Shang T.、Xu Y.、Sun L.、Cheng W.、Jiang D.、Zhan Q.、Li Y.、Xie Y.、Hu X.、Xie W.

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Key Laboratory of Polar Materials and Devices (MOE) School of Physics and Electronic Science East China Normal University

State Key Laboratory of Magnetism and Beijing National Laboratory for Condensed Matter Physics Institute of Physics Chinese Academy of Sciences

Key Laboratory of Magnetic Materials and Devices Ningbo Institute of Material Technology and Engineering Chinese Academy of Sciences

Engineering Research Center for Nanophotonics and Advanced Instrument (MOE) School of Physics and Electronic Science East China Normal University

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2022

10.1016/j.jallcom.2022.165566

Journal of Alloys and Compounds

Journal of Alloys and Compounds

EISCI
ISSN：0925-8388
年,卷(期)：2022.917
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