Copper Electrodeposition in Sulfuric Acid Containing Chloride Ions Investigated by Channel Flow Double Electrode

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外文标题：Copper Electrodeposition in Sulfuric Acid Containing Chloride Ions Investigated by Channel Flow Double Electrode

作者：

Masayuki Itagaki、Isao Shitanda、Kunihiro Watanabe

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作者单位：

Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science, Noda, Chiba 278-8510, Japan

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出版年：

2002

材料科学

ISSN：0388-3930

年,卷(期)：2002.39(2)