首页|UV sensitivity enhancement in ZnO:Cu films through simple post-annealing treatment
UV sensitivity enhancement in ZnO:Cu films through simple post-annealing treatment
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NSTL
Elsevier
Influence of post-annealing temperature on structural, morphological, optical, and electrical properties of ZnO:Cu films was investigated. The films were deposited using the ultrafast spray pyrolysis technique for 10 s. Post-annealing treatment was then conducted at a temperature range of 400-600 degrees C under ambient pressures. Structural, morphological, electrical, and optical properties were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), current-voltage (I-V) curve, and UV-Vis spectroscopy, respectively. By increasing the annealing temperature, SEM images show morphology modification from rods to spherical grain due to atomic rearrangement. XRD patterns show significant improvement in crystallinity. From I-V curves, the sensitivity of UV detection is also increased. The increase of annealing temperature provokes both the dark current and photocurrent enhancement. UV-Vis spectroscopy analysis shows the decrease of bandgap by increasing the annealing temperature. Our study is essential to improve the functionality of ZnO:Cu film and realizes mass-scale fabrication with low cost.
NSTL
Elsevier
