Abstract
In this study, we investigate the characteristics of barium-addition indium-zinc-tin-oxide (B–IZTO) channels fabricated by the co-sputtering of barium-tin-oxide and indium-zinc-tin-oxide (IZTO) targets for the operation of thin film transistors (TFTs) and light emitting transistors (LETs). The X-ray photoelectron spectroscopy (XPS) analysis verifies that increasing the BaSnO3 sputtering power significantly decreases the concentration of oxygen vacancy from 35.0% to 16.3%. In addition, increasing the Ba concentration in the B–IZTO films increases the average transmittance of the B–IZTO channel in the visible light region (400–800 nm) from 86.7% to 88.3%, and the electrical resistivity from 84.3 to 5408 Ω?cm, respectively. We find that the appropriate composition of Ba in the IZTO channels greatly improves the subthreshold swing (SS), the stability against the negative bias illumination stress (NBIS) of the B–IZTO channels-based TFTs. As the Ba content of the IZTO channel layer increases, SS decreases from 0.49 to 0.13 V/decade and the threshold voltage shift (ΔVTH) by NBIS reduces from ? 13.1 to ? 5.07 V, respectively. In the case of the B–IZTO-based LET with the highest Ba content, the device has the lowest light turn on voltage (VON) of 1.84 V, and shows the maximum brightness of 1.53 × 104 cd/m2. In this study, we confirm that the addition of Ba in the IZTO effectively suppresses the oxygen vacancies in the IZTO channel, resulting in the enhanced stability of the B–IZTO-based TFTs, and improves the performance of the B–IZTO-based LETs.
NSTL
Elsevier