首页|One-step immobilization of tungsten oxide on microporous silica surface as a photocatalyst for water pollutant removal
One-step immobilization of tungsten oxide on microporous silica surface as a photocatalyst for water pollutant removal
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Improving photocatalytic properties of semi-conductor materials and Band-gap engineering are a major challenge. Herein, we report, a successful immobilization of tungsten oxide and tungstite on the surface of micro-porous silica by simple one-step method. The surface area decreased from 607 to 588 m~2/g after immobilization due to the loading of tungsten oxide species on silica pores. While, the band-gap energies were found to be 2.21, 2.41 eV for SiO2/WO3 and SiO2/WO3-C, respectively. Thereafter, the photocatalytic activity of the composites was studied through the oxidative degradation of sulfamethazine under UV-visible light irradiation, SiO2/WO3 exhibited relatively good stability and reusability after four cycles of photocatalytic experiment in respect to the calcinated sample. The high photocatalytic activity and recyclability of the non-calcinated sample are attributed to the presence of water molecules in tungstite structure, assuming that tungsten oxide species are bonded to microporous silica via hydrogen bond interaction.
PhotocatalystSemi-conductorImmobilizationMicroporous silicaHydrogen bond
Oussama Oulhakem、Hammam Zahdi、Mohammed Belaiche
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Thin Film Photovoltaic Laboratory, Electric and Photovoltaic Department, Green Energy Park (IRESEN/UM6P), km2 R206, Benguerir, Morocco
Nanoscience and Nanotechnology Unit, E.N.S Rabat, Energy Research Centre, Faculty of Sciences, Mohammed V University, B.P. 5118, Takaddoum, Rabat, Morocco
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