首页|Study of training effect by Kerr microscopy measurement in Fe thin film implanted with F-ions
Study of training effect by Kerr microscopy measurement in Fe thin film implanted with F-ions
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NSTL
Elsevier
The training effect and the evolution of magnetic domain during the magnetization irreversible process of Fe thin film which exhibits exchange bias after F-ion implantation have been studied. Kerr microscopy measurements were carried out at different temperatures of the exchange bias F-implanted Fe thin film after the field-cooling from room temperature. With increasing anti-ferromagnetic (AFM) FeF2 layer thickness, the value of exchange bias increases and the training effect becomes weaker. Temperature-dependent study of exchange bias field indicates that with increasing F-ion fluences the disorder decreases at the Fe/FeF2 interface. Specimen of higher ion-fluence indicates a behavior that is changing from non-equilibrium state to equilibrium state and behavior of training effect is suggesting step-like.
NSTL
Elsevier
