首页|Structure, composition and mechanical properties of reactively sputtered (TiVCrTaW)Nx high-entropy films
Structure, composition and mechanical properties of reactively sputtered (TiVCrTaW)Nx high-entropy films
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NSTL
Elsevier
? 2022 Elsevier B.V.Nitride and metallic ?lms multi-element (TiVCrTaW)Nx high-entropy alloy were deposited on silicon wafers by pulse DC magnetron sputtering. The microstructure and mechanical properties of the films prepared with different nitrogen gas flow ratios were studied. The results show that the concentration of nitrogen approached the stoichiometric composition at nitrogen gas ratio RN ≥ 33.3 %. The alloy ?lm deposited with pure argon atmosphere exhibited a BCC structure and a very smooth surface, while an FCC with (111) or (200) preferred orientation and granular surface morphologies was observed in those ?lms prepared with introduction of nitrogen gas. The (TiVCrTaW)Nx films exhibited enhanced hardness upon the addition of nitrogen probably due to the solid-solution strengthening effect and grain refinement. The nitride ?lm achieved the highest hardness and Young's modulus of 38 GPa and 340 GPa, respectively. The results show that the deposition atmosphere plays a vital rule in the structure and the properties of the (TiVCrTaW)Nx high-entropy films.
Hard coatingHigh-entropy ?lmPulse DC sputteringSolid-solution
Tu Y.、Liu X.、Cheng B.、Xie Z.、Ye J.、Huang X.、Fu S.、Yuan Y.、Zhao J.、Wang W.
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Shanghai Institute of Laser Plasma
School of Materials Science and Engineering Jiangsu University of Science and Technology
Laboratory of Thin Film Optics Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences
NSTL
Elsevier
