首页|(162832)Loading Rh single atoms onto hollow cubic Cu_2MoS_4 nanoparticles for decreased electron/hole recombination and increased photocatalytic performance
(162832)Loading Rh single atoms onto hollow cubic Cu_2MoS_4 nanoparticles for decreased electron/hole recombination and increased photocatalytic performance
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NSTL
Elsevier
In this study, hollow cubic Cu_2MoS_4 nanoparticles were synthesized via a facile hydrothermal method. Following that, Rh single atoms were loaded onto the surface of Cu_2MoS_4 nanoparticles to prevent electron/ hole recombination. The cubic morphology of Cu_2MoS_4 nanoparticles and the presence of Rh atoms were investigated by Transmitting Electron Microscope (TEM). The crystal structure of the synthesized Rh-loaded Cu_2MoS_4 was studied by X-ray diffraction (XRD). The shift in Rh X-ray Photoelectron Spectroscopy (XPS) peaks indicated the intimate interaction between Rh and Cu_2MoS_4, providing a pathway for the charge transfer. The photocatalytic efficiency of the synthesized photocatalysts was significantly enhanced by introducing Rh single atoms onto the Cu_2MoS_4 surface. Consecutive photocatalytic dye degradation experiments revealed that Rh-loaded Cu_2MoS_4 nanoparticles could be recycled and reused multiple times with no drop in the photocatalytic efficiency. The improved photocatalytic performance of Rh-loaded Cu_2MoS_4 was attributed to a lower charge transfer resistance, higher charge transfer rate, and longer charge carrier lifetime. The most crucial reactive radical was detected to be O_2~-~ while e~- and h~+ are also playing an essential role in the photocatalytic degradation of RhB on Rh-loaded Cu_2MoS_4. This study highlighted the importance of forming a Schottky junction between Rh and Cu_2MoS_4 to enhance charge carrier separation and improve photocatalytic efficiency.
Rh single atomsHollow Cu_2MoS_4 nanoparticlesDecreased electron/hole recombinationPhotocatalytic RhB/MB degradation
Wei Wei、Haoyang Gong、Lin Sheng
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School of Environment and Energy Engineering, Anhuijianzhu University, Hefei 230601, China
NSTL
Elsevier
