首页|Phase tailoring of Ta films via buffer layer-thicknesses controlling
Phase tailoring of Ta films via buffer layer-thicknesses controlling
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NSTL
Elsevier
? 2022Hard β-Ta phase is generally produced during Ta film deposition. While in some cases, soft α-Ta phase is preferred to ensure deformation capability. In this work, templated growth strategy by introducing Cr buffer layer is proposed to tailor the phase composition in Ta films. A broad spectrum of β-Ta/α-Ta ratio from 90% to 0% can be continuously and precisely achieved when the buffer layer thickness is correspondingly controlled from 0 to ～90 nm. Hardness of the Ta films is well proportional to the β-Ta/α-Ta ratio. The underlying mechanism of phase tailoring is rationalized by demonstrating the thickness-dependent crystallization of buffer layer.
Epitaxial growthHeterostructuresNanocrystalline metalNucleation of phase transformationsSize effect
Zuo J.D.、Wang Y.Q.、Wu K.、Zhang J.Y.、Liu G.、Sun J.
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State Key Laboratory for Mechanical Behavior of Materials Xi'an Jiaotong University
NSTL
Elsevier
