首页|New chemical pathway for large-area deposition of doped diamond films by linear antenna microwave plasma chemical vapor deposition

New chemical pathway for large-area deposition of doped diamond films by linear antenna microwave plasma chemical vapor deposition

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? 2022 Elsevier B.V.Today, boron-doped diamond (BDD) is among the key materials for electrochemical sensing and advanced oxidation of micropollutants. Therefore, a cost-effective fabrication of large-area BDD electrodes is of high interest. We present an implementation of a liquid-phase boron precursor trimethyl borate for large-area deposition of boron-doped diamond films by linear antenna microwave plasma CVD. Trimethyl borate vapors were used not only as a source of boron for doping but also as the only source of carbon and oxygen, while completely saturating the requirements for the growth of high-quality boron-doped diamond films. However, to allow for control over the doping level through maintaining the B/C and B/O ratios, carbon dioxide was employed as an additional source of carbon and oxygen. The film morphology was controllable from microcrystalline to ultra-nanocrystalline by changing the concentrations of trimethyl borate. Using this unique precursor system, we were able to grow diamond films with a doping level in range from 8 × 1017 cm?3 to 2 × 1022 cm?3 and resistivity as low as 1.16 × 10?2 Ω·cm. Low activation energies were calculated from the Arrhenius plot and growth rates as high as up to 170 nm/h for the low pressure microwave plasma CVD were reached. The investigation of the plasma emission spectrum revealed a chemical composition similar to that of hydrogen-rich plasmas with methane, and the proposed chemical reactions indicate that the diamond growth takes place via the hydroxyl radical. The results demonstrated that trimethyl borate is a suitable source of carbon and boron for the large-area growth of highly boron-doped diamond via low pressure microwave plasma CVD methods.

Boron doped diamondLarge area depositionLinear antenna microwave CVDTrimethyl borate

Pifko M.、Stehlik、Kromka A.、Vojs M.、Michniak P.、Behul M.、Marton M.、Rehacek V.

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Institute of Electronics and Photonics Faculty of Electrical Engineering and Information Technology Slovak University of Technology

Institute of Physics Czech Academy of Science

2022

Diamond and Related Materials

Diamond and Related Materials

EISCI
ISSN:0925-9635
年,卷(期):2022.126
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