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    'Beam Determination Method, Node And Storage Medium' in Patent Application Appro val Process (USPTO 20240413884)

    147-150页
    查看更多>>摘要:The following quote was obtained by the news editors from the background informa tion supplied bythe inventors: “A high frequency with abundant spectrum resourc es is an effective means to improve theperformance of a wireless system. Howeve r, since the high frequency has a relatively high carrier frequencyand a large path loss, a sending direction needs to be aligned with a user according to the beamformingtechnique, thereby concentrating energy to transmit information so a s to overcome performance degradationcaused by an excessively large path loss. Generally, a method for obtaining a direction of a transmitor receive beam is t o perform beam sweeping in each direction and select a beam direction with relatively good performance as the beam direction for transmitting the information. W hen the beam sweepingis performed, each beam corresponds to one reference signa l resource. In a case of a very thin beam,many beam directions need to be swept , and correspondingly, an overhead of the reference signal resourceis very larg e. As shown in FIG. 1, if a regular beam, such as a single beam based on discret e Fouriertransform (DFT), is used, more beams in different directions need to b e swept when beam sweeping isperformed, thereby requiring a larger overhead of pilot resources. As shown in FIG. 2, if an irregular beamresource, such as a be am including multiple superimposed beam directions, is used, beams in multiple directions can be simulated at a time, thereby reducing the number of times of be am sweeping. However, abeam orientation, beam width and beam gain of the irregu lar beam are all uncertain. At present, althoughartificial intelligence (AI) ca n reduce the number of reference signal resources for beam sweeping to acertain extent, too many samples need to be trained due to a relatively thin beam at a parameter trainingstage, resulting in prohibitive cost.”

    'Beam Determination Method, Node And Storage Medium' in Patent Application Appro val Process (USPTO 20240413884)

    147-150页
    查看更多>>摘要:The following quote was obtained by the news editors from the background informa tion supplied bythe inventors: “A high frequency with abundant spectrum resourc es is an effective means to improve theperformance of a wireless system. Howeve r, since the high frequency has a relatively high carrier frequencyand a large path loss, a sending direction needs to be aligned with a user according to the beamformingtechnique, thereby concentrating energy to transmit information so a s to overcome performance degradationcaused by an excessively large path loss. Generally, a method for obtaining a direction of a transmitor receive beam is t o perform beam sweeping in each direction and select a beam direction with relatively good performance as the beam direction for transmitting the information. W hen the beam sweepingis performed, each beam corresponds to one reference signa l resource. In a case of a very thin beam,many beam directions need to be swept , and correspondingly, an overhead of the reference signal resourceis very larg e. As shown in FIG. 1, if a regular beam, such as a single beam based on discret e Fouriertransform (DFT), is used, more beams in different directions need to b e swept when beam sweeping isperformed, thereby requiring a larger overhead of pilot resources. As shown in FIG. 2, if an irregular beamresource, such as a be am including multiple superimposed beam directions, is used, beams in multiple directions can be simulated at a time, thereby reducing the number of times of be am sweeping. However, abeam orientation, beam width and beam gain of the irregu lar beam are all uncertain. At present, althoughartificial intelligence (AI) ca n reduce the number of reference signal resources for beam sweeping to acertain extent, too many samples need to be trained due to a relatively thin beam at a parameter trainingstage, resulting in prohibitive cost.”

    Patent Issued for Automated decant system (USPTO 12162686)

    150-153页
    查看更多>>摘要:News editors obtained the following quote from the background information suppli ed by the inventors:“In conventional retail stores, the most cost-efficient met hod of replenishing store inventories is by deliveringinventory from supplying manufacturers to the retail stores by the case. In a conventional distribution model, the retailer receives pallets of cases including inventory, which inventor y is also referred to as “eaches.”Conventionally, received eaches are stripped of their packaging, organized by Stock Keeping Unit or “SKU,” and then transferr ed to storage containers for storage until needed. At least some of these steps havetraditionally been performed manually.”

    Patent Issued for Automated decant system (USPTO 12162686)

    150-153页
    查看更多>>摘要:News editors obtained the following quote from the background information suppli ed by the inventors:“In conventional retail stores, the most cost-efficient met hod of replenishing store inventories is by deliveringinventory from supplying manufacturers to the retail stores by the case. In a conventional distribution model, the retailer receives pallets of cases including inventory, which inventor y is also referred to as “eaches.”Conventionally, received eaches are stripped of their packaging, organized by Stock Keeping Unit or “SKU,” and then transferr ed to storage containers for storage until needed. At least some of these steps havetraditionally been performed manually.”

    Patent Issued for Co-manipulation surgical system having a robot arm removeably attachable to surgical instruments for performing laparoscopic surgery (USPTO 12 161432)

    153-157页
    查看更多>>摘要:News editors obtained the following quote from the background information suppli ed by the inventors:“Managing vision and access during a laparoscopic procedure is a challenge. The surgical assistant paradigmis inherently imperfect, as the assistant is being asked to anticipate and see with the surgeon’s eyes, withoutstanding where the surgeon stands, and similarly to anticipate and adjust how t he surgeon wants the tissueof interest exposed, throughout the procedure. For e xample, during a laparoscopic procedure, one assistantmay be required to hold a retractor device to expose tissue for the surgeon, while another assistant maybe required to hold a laparoscope device to provide a field of view of the surgi cal space within the patientto the surgeon during the procedure, either one of which may be required to hold the respective tools inan impractical position, e .g., from between the arms of the surgeon while the surgeon is actively operating additional surgical instruments.

    Patent Issued for Co-manipulation surgical system having a robot arm removeably attachable to surgical instruments for performing laparoscopic surgery (USPTO 12 161432)

    153-157页
    查看更多>>摘要:News editors obtained the following quote from the background information suppli ed by the inventors:“Managing vision and access during a laparoscopic procedure is a challenge. The surgical assistant paradigmis inherently imperfect, as the assistant is being asked to anticipate and see with the surgeon’s eyes, withoutstanding where the surgeon stands, and similarly to anticipate and adjust how t he surgeon wants the tissueof interest exposed, throughout the procedure. For e xample, during a laparoscopic procedure, one assistantmay be required to hold a retractor device to expose tissue for the surgeon, while another assistant maybe required to hold a laparoscope device to provide a field of view of the surgi cal space within the patientto the surgeon during the procedure, either one of which may be required to hold the respective tools inan impractical position, e .g., from between the arms of the surgeon while the surgeon is actively operating additional surgical instruments.

    Patent Issued for Process kit enclosure system (USPTO 12165905)

    157-161页
    查看更多>>摘要:Reporters obtained the following quote from the background information supplied by the inventors: “Insemiconductor processing and other electronics processing, platforms are often used that use robotic armsto transport objects such as waf ers between processing chambers, from storage areas (e.g., front openingunified pods (FOUPs)) to processing chambers, from processing chambers to storage areas , and so on. Aprocessing system, such as a wafer processing system, has one or more processing chambers for processingof substrates. A gas may be used to etch a substrate in a processing chamber (e.g., a substrate may beetched while elec trostatically clamped in position in an etch chamber). One or more process kit r ingsmay surround a substrate (e.g., to protect one or more portions of the proc essing chamber, the substrate,etc.). For example, a circular part, referred to as an edge ring or process kit ring, is positioned immediatelyoutside of the ou ter diameter of the substrate to protect the upper surface of a chuck (e.g., an electrostaticchuck) supporting the substrate from being etched by etchant chemi stry. Process kit rings are made fromseveral different materials and can have d ifferent shapes, both which affect process uniformity near theprocess kit ring. During processing, process kit rings are etched over time and result in shape c hanges aswell as changes in processing uniformity.

    Patent Issued for Process kit enclosure system (USPTO 12165905)

    157-161页
    查看更多>>摘要:Reporters obtained the following quote from the background information supplied by the inventors: “Insemiconductor processing and other electronics processing, platforms are often used that use robotic armsto transport objects such as waf ers between processing chambers, from storage areas (e.g., front openingunified pods (FOUPs)) to processing chambers, from processing chambers to storage areas , and so on. Aprocessing system, such as a wafer processing system, has one or more processing chambers for processingof substrates. A gas may be used to etch a substrate in a processing chamber (e.g., a substrate may beetched while elec trostatically clamped in position in an etch chamber). One or more process kit r ingsmay surround a substrate (e.g., to protect one or more portions of the proc essing chamber, the substrate,etc.). For example, a circular part, referred to as an edge ring or process kit ring, is positioned immediatelyoutside of the ou ter diameter of the substrate to protect the upper surface of a chuck (e.g., an electrostaticchuck) supporting the substrate from being etched by etchant chemi stry. Process kit rings are made fromseveral different materials and can have d ifferent shapes, both which affect process uniformity near theprocess kit ring. During processing, process kit rings are etched over time and result in shape c hanges aswell as changes in processing uniformity.

    Researchers Submit Patent Application, 'Terminal Device, First Network Element A nd Second Network Element', for Approval (USPTO 20240414523)

    161-164页
    查看更多>>摘要:News editors obtained the following quote from the background information suppli ed by the inventors:“In the related technical field, AI service data can only b e transmitted inside a core network, and a NetworkData Analytics Function (NWDA F) network element sends the analysis results of the AI service, to anApplicati on Function (AF) network element to implement the transmission of the AI service data.

    Researchers Submit Patent Application, 'Terminal Device, First Network Element A nd Second Network Element', for Approval (USPTO 20240414523)

    161-164页
    查看更多>>摘要:News editors obtained the following quote from the background information suppli ed by the inventors:“In the related technical field, AI service data can only b e transmitted inside a core network, and a NetworkData Analytics Function (NWDA F) network element sends the analysis results of the AI service, to anApplicati on Function (AF) network element to implement the transmission of the AI service data.