Fe40Co20B20-SiO2 thin films were deposited by magnetron sputtering,and their microstructure and magnetic properties were analyzed.It was found that with the increase of SiO2 sputtering power,the roughness,ferromagnetic resonance frequency,permeability and saturation magnetization of Fe40Co20B20-SiO2 films decrease,and the resistivity of the films increases.When the SiO2 sputtering power is 500 W,the resistivity of Fe40Co20B20-SiO2 film is as high as 1973 μΩ·cm,and the cut-off frequency is as high as 3.67 GHz.Compared with that of film without SiO2,its resistivity has been greatly improved,and cutoff frequency increases slightly.Therefore,the Fe40Co20B20-SiO2 thin film prepared by this method can be effectively applied to the soft magnetic thin film inductor in GHz band.
Fe40Co20B20-SiO2 filmmagnetron sputteringSiO2 sputtering powermagnetic propertiesresistivitycut-off frequency
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