According to the domestic manufacturing and process requirements for semiconductor devices,a vertical oxidation furnace is designed for 200 mm(8 inch)wafer.The functional characteristics and the design points of several key parts are introduced,especially the furnace system.The platform for equipment and process validation is built after fabrication of this device,according to the process validation results,the equipment meets the product process requirements,and the film thickness uniformity is better than ±2％.
关键词
立式扩散/旋转舟架/传片系统
Key words
Vertical oxidation furnace/Rotating boat frame/Film transfer system
维普
万方数据