To study the influence of process parameters on the single-layer passivation film process of mercury cadmium tellruide infrared devices,this paper uses a specialized magnetron sputtering system equipment for passivation film of infrared devices as the experimental carrier,and guides the design of magnetron sputtering cathode targets through simulation optimization to accelerate the preparation of magnetron sputtering target,simulation and experimental methods are combined to study the influence of process parameters such as target base distance and target bias angle on coating uniformity,and obtain an optimal set of process parameter values,in order to form a stable and uniform film layer for the passivation film process,to lay the foundation for further research on double-layer passivation film layers.
维普
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