电子工业专用设备2024,Vol.53Issue(2) :58-62.

解理设备的设计与分析

Design and Analysis of Cleavage Equipment

王鹏举 张靖 毛善高 王洪卫 杨兴平 郭鹏
电子工业专用设备2024,Vol.53Issue(2) :58-62.

解理设备的设计与分析

Design and Analysis of Cleavage Equipment

王鹏举 1张靖 1毛善高 1王洪卫 1杨兴平 1郭鹏1
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作者信息

  • 1. 上海微高精密机械工程有限公司,上海 201201
  • 折叠

摘要

具有解理面的晶圆解理时容易产生晶圆端面损伤,为了降低晶圆解理加工时的损伤,设计一套通过利用晶圆材料特性对晶圆进行解理加工的设备,降低了具有解理面材料晶圆解理加工时的端面损伤,实验结果表明通过该设备对具有解理面的晶圆解理加工可以获得无损伤、光滑的解理面.

Abstract

Wafers with cleavage surfaces are prone to damage at the wafer end face during cleavage.In order to reduce the damage during wafer cleavage,design a set of equipment for wafer cleavage processing by utilizing the characteristics of wafer materials,reducing the end face damage during wafer cleavage.The experimental results show that the device can obtain non-destructive,undamaged,and smooth cleavage surfaces during wafer cleavage processing.

关键词

解理面/材料特性/晶圆

Key words

Cleavage surface/Material characteristics/Wafer

引用本文复制引用

出版年

2024
电子工业专用设备
中国电子科技集团公司第四十五研究所

电子工业专用设备

影响因子:0.157
ISSN:1004-4507
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