首页|SiC高温退火表面保护薄膜制备的研究

SiC高温退火表面保护薄膜制备的研究

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采用光刻胶涂覆、PVD、PECVD和RIE方法制备的类金刚石(DLC)薄膜覆盖于SiC晶片表面,作为SiC离子注入后高温激活退火的保护层,高温退火后晶片表面均无明显形貌退化,从薄膜应力、厚度、产能及成本等方面对 4 种方法进行了对比和分析.
Preparation of SiC Surface Protective Film Annealed at High Temperature
Diamond-like carbon(DLC)films prepared by photoresist coating,PVD,PECVD and RIE cover the surface of SiC wafer as the protective layer for high-temperature activation annealing after SiC ion implantation.There is no obvious morphological degradation on all the wafer surfaces after high-temperature annealing.The four methods are compared and analyzed from the aspects of film stress,thickness,productivity and cost.

SiC(Silicon carbide)DLC(Diamond-like carbon)High temperature anneal

刘相伍、李波、陟金华、朱江涛

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北京国联万众半导体科技有限公司,北京 101318

碳化硅 类金刚石 高温退火

2024

电子工业专用设备
中国电子科技集团公司第四十五研究所

电子工业专用设备

影响因子:0.157
ISSN:1004-4507
年,卷(期):2024.53(3)
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