In order to improve the stability and control accuracy of the electron beam exposure machine's light column controller,a relatively complete hardware design scheme is proposed for a new type of light column control through years of research. By precisely controlling parameters such as electron beam focusing,centering,deflection,and scanning exposure,the digital signals generated by the pattern generator are transformed into corresponding analog quantities,and the electron beam is stably controlled to scan and expose the mask substrate placed on the laser worktable,thereby achieving high-quality production.
关键词
电子束曝光机/光柱/聚焦/束闸/偏转/数模转换(DAC)转接
Key words
Electron beam lithography machine/Beam column/Focusing/Beam gate/Deflection/DAC conversion
维普
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