Application of PTPC in Chemical Mechanical Planarization
Chemical mechanical planarization(CMP) needs to control wafer profile accurately in the pro-cess of copper. Precise tuning process control (PTPC) can detect the real-time copper thickness by sen-sor,and adjust head zone pressure by close-loop. This method realizes more uniform of copper film polish and profile control. The detection principle and control flow of PTPC system are introduced.
Precise tuning process control(PTPC)Close-loopPressureWafer film profile