Recently,two-dimensional(2D)transition metal dichalcogenides(TMDs)have attracted signifi⁃cant attentions due to their intriguing properties,such as tunable bandgaps,valley related physics and high catalytic activity,which endow them promising applications in electronics,optoelectronics and energy related fields. To promote these applications,the batch production of large-scale and thickness-uniform TMDs films is an essential issue. Chemical vapor deposition(CVD)has been proved to be a facile route for the syntheses of large-area uniform high-quality 2D materials. This topical review hereby focuses on the introduction of the state-of-the-art CVD methods for the large-scale syntheses of TMDs films through two key strategies,from the viewpoints of precursor delivery design and substrate engineering. The related mechanisms and specific parameter optimizations towards high-quality growth are also discussed. In addition,the applications of the CVD derived high-quality TMDs in electronics,optoelectronics,electro-/photo-catalysis are also introduced. Finally,the current challenges for the syntheses of large-area uniform and high-quality TMDs are proposed, and the future directions in these developing fields are also forecasted.
Transition metal dichalcogenideChemical vapor depositionLarge areaElectrochemistry
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