基于阿伏苯宗-阿魏酸的光释放与抗氧化性能
Photorelease and Antioxidant Activity of Avobenzone-Ferulic Acid
张天龙 1陈光1
作者信息
- 1. 陕西科技大学化学与化工学院,西安 710021
- 折叠
摘要
阿魏酸是一种有效的抗氧化剂,因具有抵抗氧化应激和延缓皮肤衰老性能而被广泛应用于化妆品中.然而,光敏性对其应用提出了挑战.为了克服这一限制,本文开发了一种由阿伏苯宗(AB)和阿魏酸(FA)组成的二元分子.该设计基于阿伏苯宗结构中存在可以光去除的苯甲酰甲基,以保护阿魏酸免受光损伤并保持其抗氧化活性.研究结果表明,FA得以成功释放,AB对FA具有有效的光保护作用.体外实验结果表明,AB-FA分子及其光解产物具有显著的清除自由基活性;而细胞实验结果则证实其较低的细胞毒性和优异的清除活性氧自由基(ROS)能力.
Abstract
Ferulic acid is an effective antioxidant that is widely used in the cosmetics due to its ability to resist oxidative stress and delay skin aging.However,its photosensitivity challenges its application.In order to overcome this limitation,we developed a binary molecule composed of avobenzone(AB)and ferulic acid(FA).This design is based on the existence of photoremovable benzoyl methyl in the avobenzone to protect ferulic acid from photodamage and maintain its antioxidant activity.The results showed that FA was successfully released,and AB had an effectively photoprotective effect on FA.In vitro experiments showed that AB-FA molecules and their photolysis products had significant activity of scavenging free radical,while cell experiments confirmed their low cytotoxicity and excellent ability to reactive oxygen species(ROS)scavenging.
关键词
阿伏苯宗/光保护/清除自由基活性Key words
Avobenzone/Photoprotection/Free radical scavenging activity引用本文复制引用
基金项目
国家自然科学基金(22174090)
陕西省自然科学基础研究计划项目(2022JM-089)
陕西省高层次人才创新长期项目(陈光)()
国家外国专家计划高端项目(G2021041002L)
出版年
2024
国家科技期刊平台
NSTL
万方数据