Sensitivity of Structures to Random Defects in Film-substrate Systems
Random defects due to differences in raw materials and the complexity of the manufacturing process are inevitable in engineering structures.Based on the inherent characteristics of sensitivity to de-fects in the film-substrate system,the Monte Carlo method is applied in the study of the stability of struc-tures with random defects,coupled with numerical simulations to investigate the morphological evolution and post-buckling equilibrium path of film-substrate systems with random defects during instability.The numerical results show that the critical load of the structure with random defects is unstable.The defects significantly reduce the critical load of the structure,and the random defects destroy the symmetry of the structure,leading to a transformation from an ordered checkerboard pattern to a disordered fold nuclear pattern,hence affecting the subsequent morphological trend.This analysis assesses the potential risks and effects of random defects in thin-film structures,aiming to improve the reliability and performance of thin-film devices,coatings and surface treatments,and to bridge the gap between theoretical stability research findings and practical design applications.
random defectsdefect sensitivitymorphology evolutionpost-bucklingstability