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六次甲基四胺对电镀锌电沉积过程的影响

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采用循环伏安法和电化学阻抗谱,分析了六次甲基四胺对锌电沉积过程的影响.循环伏安测试结果表明:六次甲基四胺的加入使得锌的电沉积电位负移,说明六次甲基四胺在金属基体活性位点的吸附,使得锌电沉积的形核和生长需要在更大的阴极过电位下发生.同时六次甲基四胺提高了电沉积锌层在腐蚀介质中的耐蚀性.
Influence of hexamethylenetetramine on electrochemical process of Zn-electrodeposition
The influence of hexamethylenetetramine (HMTA) on the Zn electrodeposition process was analyzed using cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS) techniques.The results of CV analysis showed that the adding of HMTA shift the reduction potential of Zn electrodeposition to more negative values,indicating that the adsorption of HMTA on the active sites of the metal substrate hindered the nucleation and growth process of the Zn electrodepesition which happened under a larger cathodic overpotential.At the same time,The corrosion resistance of the Zn deposition was increased with the presence of HMTA.

hexamethylenetetramineelectrodepositionN-heterocycleZn electrodeposition process

黄道兵、蔡捷、董蓓、冯冠文、涂元强

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宝钢股份中央研究院武汉分院,湖北武汉430080

华中科技大学化学与化工学院,湖北武汉430074

六次甲基四胺 电沉积 氮杂环 电沉积过程

2017

钢铁研究
武汉钢铁(集团)公司

钢铁研究

CSTPCD
影响因子:0.314
ISSN:1001-1447
年,卷(期):2017.45(5)
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