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退火温度对铁酸铋薄膜光学性质的影响

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分别在硅衬底和石英衬底上使用射频磁控溅射法制备铁酸铋(BiFeO3)薄膜,主要研究退火温度对BiFeO3 薄膜的形貌、成分及光学性质的影响.试验结果表明,不同温度退火处理后,BiFeO3 薄膜的晶粒尺寸明显变大,且成分发生了较大变化;通过测试BiFeO3 薄膜的透射谱和反射谱,发现退火温度为450℃时,其禁带宽度最窄.
Effects of Optical Properties of Bismuth Ferrite Thin Films
The bismuth ferrite(BiFeO3)thin films were prepared on silicon substrate and quartz substrate by radio frequency magnetron sputtering,respectively.The influence of annealing temperature on the morphology,composition and optical properties of BiFeO3 thin films was studied.Experimental results showed that the grain size of BiFeO3 thin films increased and composition changed greatly after annealing at different temperatures.By testing the transmission and reflection spectra of BiFeO3 thin films,it was found that BiFeO3 thin films had the narrowest bandgap when the annealing temperature was 450℃.

bismuth ferrite thin filmsmagnetron sputteringannealing temperatureoptical properties

朱德明

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铜基新材料江西省重点实验室,江西 南昌 330096

江西省科学院应用物理研究所,江西 南昌 330096

铁酸铋薄膜 磁控溅射 退火温度 光学性质

2024

热处理技术与装备
江西省科学院应用物理研究所 中国热处理行业协会

热处理技术与装备

影响因子:0.3
ISSN:1673-4971
年,卷(期):2024.45(6)