首页|饱和活性炭热再生过程残余物形成及影响因素分析

饱和活性炭热再生过程残余物形成及影响因素分析

扫码查看
饱和活性炭热再生工艺具有适用性强、对吸附质没有选择性的优点,是工业处理中最常用的方法,但热再生过程中吸附质在活性炭内发生分解、聚合等反应,残余物沉积在孔隙中,造成堵塞,使热再生处理后的活性炭比表面积和孔容积下降。了解热再生过程残余物沉积的机理及关键影响因素,减少残余物沉积,最大化恢复活性炭的吸附性能是热再生的关键。简要介绍了活性炭热再生工艺及再生过程中残余物沉积的机制,重点综述了再生过程中单一和混合吸附质情况下残余物沉积的特点,以及吸附质和活性炭的物化性质与残余物沉积的关系,阐明了热再生温度、气氛、再生加热速率、吹扫气体流速以及多种操作条件对残余物沉积的影响机制,据此对未来活性炭再生的工业发展方向提出建议。
Analysis of heel formation and influencing factors during the thermal regeneration process of saturated activated carbon
Thermal regeneration is the most commonly used method for treating saturated activated carbon due to its high processing capacity and non-selectivity for adsorbates.However,during thermal regeneration,the adsorbates go through decomposition,polymerization and other reactions inside the activated carbon.The heels are deposited in the pores,causing blockage and decreasing the specific surface area and pore volume of the activated carbon after thermal regeneration.To ensure successful thermal regeneration,it is crucial to understand the mechanism and key factors influencing heel deposition,reduce its occurrence,and maximize the restoration of adsorption performance.This article provided an overview of the thermal regeneration process of activated carbon,and the mechanisms of heel deposition during regeneration.It focused on the characteristics of heel deposition under single and mixed ad-sorbates in the regeneration process,as well as the relationship between the physicochemical properties of adsor-bates,activated carbon and heel deposition.The influence of thermal regeneration temperature,atmosphere,regen-eration heating rate,purge gas flow rate,and other operating conditions on heel deposition was elucidated.Accord-ingly,recommendations were provided for the future industrial development of activated carbon regeneration.

activated carbonregenerationheeladsorptionoperating conditions

张伟业、申婧、潘子鹤、宋一朋、成怀刚、张慧荣

展开 >

山西大学资源与环境工程研究所,山西 太原 030031

太原固废处置中心,山西 太原 030000

活性炭 再生 残余物 吸附 操作条件

2025

工业水处理
中海油天津化工研究设计院

工业水处理

北大核心
影响因子:0.737
ISSN:1005-829X
年,卷(期):2025.45(1)