首页|BiOCl碱性条件下光催化氧化去除As(Ⅲ)

BiOCl碱性条件下光催化氧化去除As(Ⅲ)

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通过调控水热反应时间制备了一系列BiOCl半导体光催化剂,通过X射线衍射、透射电子显微镜、紫外-可见吸收光谱和X射线光电子能谱等表征手段对催化剂的晶体结构、微观形貌、光谱学特性和化学组成性质等进行系统分析.实验所制备的BiOCl材料在碱性条件下实现了对As(Ⅲ)较好的光催化转化性能,同时研究了BiOCl-8在不同pH值条件下对As(Ⅲ)去除性能.结果表明,在初始pH=10时,0.5 g·L-1的BiOCl-8在光照30 min内可以将溶液中5 mg·L-1的As(Ⅲ)完全去除.
Removal of As(Ⅲ)by photocatalytic oxidation under BiOCl alkaline condition
A series of BiOCl semiconductor photocatalysts were prepared by adjusting the hydrothermal reaction time.The crystal structure,microstructure,spectral characteristics and chemical composition of the catalysts were systematically analyzed by means of X-ray diffraction,transmission electron microsco-py,UV-visible absorption spectroscopy and X-ray photoelectron spectroscopy.The photocatalytic conver-sion of As(Ⅲ)was achieved by BiOCl material prepared in the experiment under alkaline conditions.At the same time,the removal performance of As(Ⅲ)by BiOCl-8 at different pH values was studied.The results show that 0.5g·L-1 BiOCl-8 can completely remove 5 mg·L-1As(Ⅲ)from the solution within 30 min of illumination at initial pH=10.

BiOClAs(Ⅲ)photocatalytic

王朝、李艳芳、次仁卓嘎、谭欣、于涛

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西藏大学理学院,拉萨 850000

天津大学环境学院,天津 300350

天津大学化工学院,天津 300350

氯氧化铋 As(Ⅲ) 光催化

地区科学基金

22066022

2024

化学工业与工程
天津化工学会 天津大学

化学工业与工程

CSTPCD北大核心
影响因子:0.406
ISSN:1004-9533
年,卷(期):2024.41(3)
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