首页|高性能锑化物中红外半导体激光器的研究进展

高性能锑化物中红外半导体激光器的研究进展

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半导体材料体系经历了 3次重要迭代,在微电子、通信、人工智能、碳中和等重要领域得到了广泛应用.随着高新技术的快速发展,锑化物半导体作为最具发展前景的第4代半导体材料之一,在开发下一代高性能、小体积、低功耗、低成本的红外光电器件领域具有独特的优势和广阔的应用前景.综述了锑化物半导体激光器的发展过程和国内外的研究现状,分析了器件结构设计、材料外延、模式选择、波长扩展等关键问题,阐述了采用分子束外延技术生长高性能锑化物量子阱激光器,实现大功率、单模、高光束质量的锑化物激光器的设计方案和关键工艺技术,并对兼具低成本、高成品率、大功率等优异特性的单模锑化物激光器的研究前景进行了展望.
Research progress on high preformance mid-infrared antimonide semiconductor lasers
Going through three important iterations,semiconductor material systems have been widely used in important fields such as microelectronics,communications,artificial intelligence,and carbon neutrality.With the rapid development of technologies,the research ona new generation of high-performance semiconductor materials and devices has become the focus of international anvanced technology.As one of the most promising fourth-generation semiconductor material,antimonide semiconductor materials have unique advantages andbroad application prospects in developingnext-generation high-performance,small-volume,low-power,and low-cost infrared optoelectronic devices.In this paper,the development process and research status of antimonide semiconductor lasers at home and abroad were reviewed,the key issues such as design of device structure,material epitaxial growth,mode selection and wavelength expansion were analyzed,high-performance antimonide quantum well lasers have been grown by molecular beam epitaxy technology.The design scheme and key technology for realizing high-power,single-mode and high-beam quality antimonide lasers were emphasized,and the research prospect of single-mode antimonide lasers with excellent characteristics such as low cost,high yield and high power was predicted.

lasersantimonidemid-infraredquantum well semiconductor laser

曹钧天、杨成奥、陈益航、余红光、石建美、王天放、闻皓冉、王致远、耿峥琦、张宇、赵有文、吴东海、徐应强、倪海桥、牛智川

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中国科学院半导体研究所光电子材料与器件重点实验室,北京 100083,中国

中国科学院大学材料科学与光电技术学院,北京 100049,中国

激光器 锑化物 中红外 量子阱激光器

2024

激光技术
西南技术物理研究所

激光技术

CSTPCD北大核心
影响因子:0.786
ISSN:1001-3806
年,卷(期):2024.48(6)