氧化工艺对GH2132合金抗氧化性能的影响
Effect of oxidation process on oxidation resistance of GH2132 alloy
徐超凡 1陈佳俊 1王守乾 1赵守忠 1沈佳宝 1闵亮1
作者信息
- 1. 江苏科技大学材料科学与工程学院,江苏镇江 212100
- 折叠
摘要
对GH2132合金进行900 ℃和650℃的氧化试验,利用XRD分析了氧化膜的主要产物,利用扫描电镜观察氧化膜的表面及截面形貌,结合EDS能谱数据,研究了 GH2132合金的氧化机理.结果表明,在900 ℃下,GH2132合金氧化膜主要由Cr2O3+Fe2O3组成,抗氧化性能在100～200 h由抗氧化性转变为完全抗氧化性,随着氧化保温时间的延长,发生内氧化,生成的氧化膜会产生剥落,到500 h,内氧化深度达到110.34 μm;在650 ℃下,GH2132合金表层氧化膜主要由Fe2O3、少量的Fe+2Cr2O4及Fe0.64Ni0.36组成,始终为完全抗氧化性,氧化膜紧实,没有内氧化现象,到1600 h,氧化膜厚度为15.17 μm,合金在650℃下可长期使用.
Abstract
Oxidation test of GH2132 alloy was carried out at 900 ℃ and 650 ℃,the main products of the oxide film were analysed by XRD,the surface and cross-section morphologies of the oxide film were observed by scanning electron microscope,and the oxidation mechanism of the GH2132 alloy was investigated combining with the data of EDS energy spectra.The results show that at 900 ℃,the oxide film of the GH2132 alloy is mainly composed of Cr2O3+Fe2O3,and the antioxidant property changes from antioxidant properties to complete antioxidant properties in 100-200 h.With the extension of the oxidation holding time,internal oxidation phenomenon occurs and the generated oxide film flakes off,and the depth of internal oxidation reaches 110.34 μm by 500 h.At 650 ℃,the GH2132 alloy surface oxide film mainly consists of Fe2O3 and small amounts of Fe+2Cr2O4 and Fe0.64Ni0.36,which is always completely antioxidant properties with compact oxide film,and there is no internal oxidation phenomenon.When up to 1600 h,the thickness of the oxide film is 15.17 μm,indicating that the alloy can be used for a long time at 650 ℃.
关键词
GH2132合金/氧化物/抗氧化性/氧化质量增量Key words
GH2132 alloy/oxides/oxidation resistance/oxidation mass increment引用本文复制引用
出版年
2024
NETL
NSTL
万方数据