首页|BTA与TT-LYK对铜CMP缓蚀效果和协同效应研究

BTA与TT-LYK对铜CMP缓蚀效果和协同效应研究

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在铜化学机械抛光中,由于典型缓蚀剂苯并三氮唑(BTA)对铜表面化学保护作用非常强烈,造成铜去除速率过低的现象.为了获得更好的缓蚀效果和铜表面质量,在近中性溶液中,对BTA缓蚀剂和新型缓蚀剂2,2'-[[(甲基-1H-苯并三唑-1-基)甲基]亚氨基]双乙醇-(TT-LYK)的缓蚀效果进行比较,并对2种缓蚀剂的复配效果进行研究.结果表明:在近中性溶液中,BTA和TT-LYK均可以有效抑制铜表面腐蚀;2种缓蚀剂复配后具有协同作用,添加到抛光液中可得到更好的铜表面质量和更低的粗糙度,这可能是由于2种缓蚀剂的钝化膜类别相似,使得在一种缓蚀剂形成配合物的基础上,另一种缓蚀剂对生成的钝化膜进行补充,使得双层钝化膜更致密,能更好地保护铜表面不受腐蚀.
Study on Corrosion Inhibition and Synergistic Effects of BTA and TT-LYK on Copper CMP
In copper chemical mechanical polishing,the typical corrosion inhibitor benzotriazole(BTA)has a strong chemical protection effect on the copper surface,resulting in a low copper removal rate.In order to achieve better corrosion inhibition effect and copper surface quality,the corrosion inhibition effects of BTA corrosion inhibitor and novel inhibitor of ethanol,2,2'-[[(methyl-1H-benzotriazol-1-yl)methyl]imino]bis-(TT-LYK)in near-neutral solutions were com-pared.The mixed inhibition of these two inhibitors was also investigated.The results show that both of the corrosion inhibi-tors can effectively inhibit copper surface corrosion in near-neutral solutions.The combination of two corrosion inhibitors has a synergistic effect,and adding them to the polishing solution can achieve better copper surface quality and lower roughness.This may be due to their similar types of passivation films formed,which enables another inhibitor can supple-ment the passivation film generated by one inhibitor,resulting a denser and better protective dual-layer passive film on the metal surface.

chemical mechanical polishingcoppermixed corrosion inhibitorbenzotriazolesurface roughness

孟妮、张祥龙、李相辉、谢顺帆、邱宇轩、聂申奥、何彦刚

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河北工业大学电子信息工程学院,天津 300130

天津市电子材料与器件重点实验室,天津 300130

化学机械抛光 混合缓蚀剂 苯并三氮唑 表面粗糙度

国家科技重大专项项目河北省自然科学基金项目

2016ZX02301003-004-007F2018202133

2024

润滑与密封
中国机械工程学会 广州机械科学研究院有限公司

润滑与密封

CSTPCD北大核心
影响因子:0.478
ISSN:0254-0150
年,卷(期):2024.49(2)
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