Research Status of Powder Metallurgy Technology in Preparation of Sputtering Target Materials
Magnetron sputtering target has become the preferred method for preparing all kinds of thin films due to its advantages of fast deposition rate and uniform coating.Broad application of thin film materials makes the target material demand increase year by year.In recent years,powder metallurgy technology has been widely used in target material preparation.The powder metallurgy method used in the target preparation was summarized and analyzed,and the research status of hot pressing sintering,hot isostatic pressing sintering and spark plasma sintering were described.Finally,the technical problems in the research of target preparation and the development trend were discussed.
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