金属基底上化学气相沉积法制备石墨烯研究进展
Research Progress on Graphene Prepared by Chemical Vapor Deposition Method on Metal Substrates
张光辉1
作者信息
- 1. 大连理工大学重大装备设计与制造郑州研究院,河南郑州 450000
- 折叠
摘要
石墨烯因其独特的结构以及卓越的光、电、热性能,已成为材料科学领域的研究焦点.目前,制造或分离单层和双层石墨烯的方法多种多样,其中化学气相沉积技术因其能够生产高质量石墨烯而备受青睐.化学气相沉积不仅可以在不同金属基底上成功合成石墨烯,而且具有大规模生产的潜力,操作简便,成本效益高.本文将对化学气相沉积法在不同金属基底上制备石墨烯的过程进行综述,并展望其未来的发展方向.
Abstract
Graphene has become a research focus in the field of materials science due to its unique structure and excellent optical,electrical and thermal properties.Currently,there are various methods to manufacture or separate single-and double-layer graphene,among which chemical vapor deposition technology is favored for its ability to produce high-quality graphene.Chemical vapor deposition can not only successfully synthesize graphene on different metal substrates,but also has the potential for large-scale production,is easy to operate,and is cost-effective.This article will review the process of preparing graphene on different metal substrates by chemical vapor deposition method and look forward to its future development direction.
关键词
石墨烯/化学气相沉积/金属基底Key words
graphene/chemical vapor deposition/metal substrates引用本文复制引用
出版年
2024
NETL
NSTL
万方数据