首页|脉冲放电等离子体降解壳聚糖的研究

脉冲放电等离子体降解壳聚糖的研究

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以壳聚糖浓度、乙酸浓度、极板间距和处理时间为影响因素,采用脉冲放电等离子体法制备低聚壳聚糖,并利用红外光谱法(FT-IR)和X-衍射(X-ray)进行结构表征.实验结果表明,脉冲放电等离子体可以用来制备低聚壳聚糖,降解效果与处理时间成正比;与壳聚糖浓度、乙酸浓度、极板间距成反比;在壳聚糖浓度0.3%、乙酸浓度0.5%、极板间距2mm、处理时间180min条件下,壳聚糖黏均分子量为298.87ku,降解率达73.74%.降解过程中,壳聚糖分子结构中部分-NH2可能被破坏,壳聚糖结晶结构被显著破坏.
Degradation of chitosan by high voltage pulsed discharge plasma
Degradation of chitosan by high voltage pulsed discharge plasma(HVPDP) was investigated.The Influence factors were chitosan concentration,acetic acid concentration,the distance between the electrodes and treatment time.The structure of the degraded chitosan was characterized by FT-IR,X-ray.Results showed that treatment time were positive.Chitosan concentration,acetic acid concentration and the distance between the electrodes were negative.The average molecular weight was 298.87ku,the degradation rate increased up to 73.74% after chitosan concentration 0.3%,acetic acid concentration 0.5%,the distance between the electrodes 2mm,treatment time 180min.The main polysaccharide structure of the degraded chitosan still remained.However,the partial amino groups of chitosan were eliminated during the plasma degradation process.The crystalline structure of the degraded chitosan were destroyed.

chitosanpulsed dischargeplasmadegradationcharacterization

马凤鸣、王振宇

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东北林业大学林学院,黑龙江哈尔滨 150040

哈尔滨工业大学食品科学与工程学院,黑龙江哈尔滨 150090

壳聚糖 脉冲放电 等离子体 降解 表征

2013

食品工业科技
北京一轻研究院

食品工业科技

CSTPCDCSCD北大核心
影响因子:0.842
ISSN:1002-0306
年,卷(期):2013.34(18)
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