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纳米硅对人参生长发育的影响

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以人参为试验材料,设置6个浓度硅处理:0 g/L(CK)、0。03 g/L(T1)、0。06 g/L(T2)、0。09 g/L(T3)、0。12 g/L(T4)、0。15 g/L(T5),用以探究不同硅浓度对人参生长发育的影响及变化趋势。结果表明,不同浓度施硅对人参的叶长、茎长、根长、叶宽、茎粗、根粗、生物量变化均有积极作用,施硅对促进人参生长的最佳供硅浓度为0。09 g/L。施硅对促进人参光合能力的提升有积极作用,胞间CO2 浓度在T2处理下达到最大值,较CK增高4。01%;气孔导度在T3处理下达到最大值,较CK增高100%;净光合速率在T3处理下达到最大值,较CK增高136。47%;蒸腾速率在T3处理下达到最小值,较CK降低27。54%。不同浓度施硅可以通过提高活性氧防御系统的酶活性(过氧化物酶含量)以及减轻细胞损伤程度(丙二醛含量)来增强人参根、茎、叶的整体抗性强度。不同浓度施硅可以引起人参体内硅含量的增加和持续积累,施硅增强人参硅素吸收的最优处理为0。09 g/L。以不同部位来看,追肥处理的人参硅素分布为叶>根>茎;以不同时期来看,绿果期结束、红果期开始时可能是人参吸硅的最佳时期。综上所述,人参最佳施硅浓度为0。09 g/L。本试验为促进人参生长发育和增强抗性提供实践基础,为农田栽培人参的施用硅浓度提供参考。
Effects of nano-silicon on the growth and development of ginseng
With ginseng as experimental material,6 concentrations of silicon were set up:0(CK),0.03(T1),0.06(T2),0.09(T3),0.12(T4)and 0.15 g/L(T5)were used to explore the change trend of the influence of different silicon concentrations on the growth and development of ginseng.The results showed that different concentrations of silicon application had positive effects on leaf length,stem length,root length,leaf width,stem diameter,root diameter and biomass of ginseng.The optimal concentration of silicon application for promoting ginseng growth was 0.09 g/L.Silicon application had a positive effect on the improvement of photosynthetic capacity of ginseng.Intercellular CO2 concentration reached the maximum value under T2 treatment,which was 4.01%higher than that in CK.The stomatal conductance reached the maximum value under T3 treatment,which was 100%higher than that in CK.The net photosynthetic rate reached the maximum value under T3 treatment,which was 136.47%higher than that in CK.The transpiration rate reached the minimum value under T3 treatment,which was lower than that in CK by 27.54%.The overall resistance intensity of root,stem and leaf of ginseng could be enhanced by increasing the enzyme activity of active oxygen defense system(peroxidase content)and reducing the degree of cell damage(malondialdehyde content).Different concentration of silicon application increased and accumulated silicon content in ginseng.The optimal treatment of silicon application to enhance the absorption of ginseng silicon was 0.09 g/L.In terms of different parts,the distribution of ginseng silicon in topdressing treatment was leaf>root>stem.From the perspective of different periods,the end of the green fruit period and the beginning of the red fruit period may be the best period for ginseng to absorb silicon.In summary,the optimal silicon application amount of ginseng is 0.09 g/L.This experiment provides a practical basis for promoting the growth and development of ginseng and enhancing resistance,and provides a reference for the applied silicon concentration of ginseng in farmland cultivation.

ginsengnano-siliconsilicon contentresistances

张岂源、许永华、王刚、丁旭、王娜迪、代鸣涛

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吉林农业大学新品种与开发国家地方联合工程研究中心,吉林 长春 130118

吉林抚松人参质量检测中心,吉林 抚松 134500

人参 纳米硅 硅含量 抗性

国家重点研发计划吉林省科技重大专项

2017YFC170210120200504004YY

2024

中国土壤与肥料
中国农业科学院农业资源与农业区划研究所 中国植物营养与肥料学会

中国土壤与肥料

CSTPCD北大核心
影响因子:1.197
ISSN:1673-6257
年,卷(期):2024.(1)
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