首页|β-Ga2O3/4H-SiC异质结界面的结构和电子性质

β-Ga2O3/4H-SiC异质结界面的结构和电子性质

扫码查看
利用第一性原理计算,系统性地研究了β-Ga2O3/4H-SiC异质结界面的结构和电子性质.利用满足电子计数规则的成键模型,构建了具有粗糙度小和带隙干净的绝缘界面,Si-O键在该界面的化学键中占主导地位.计算结果表明:对于β-Ga2O3和4H-SiC而言,利用杂化泛函计算得到的带隙分别为4.7 eV和3.35 eV,与实验值吻合较好;对于β-Ga2O3/4H-SiC异质结界面,该界面表现出半导体特性,其直接带隙为0.46 eV;同时,β-Ga2O3与4H-SiC形成Ⅱ型能带对齐,计算得到的价带偏移为1.72 eV,导带偏移为0.18 eV.所得结果对设计基于β-Ga2O3和4H-SiC的电子器件具有重要意义.
Structural and electronic properties of the β-Ga2O3/4H-SiC heterojunction interface
By using first-principles calculation,the structural and electronic properties of the β-Ga2O3/4H-SiC heterojunction interface are systematically investigated.An insulating interface with small roughness and clean bandgap is constructed by using a bonding model that satisfies the electron counting rules.Si-O bonding dominates the chemical bonding at this interface.The computational results show that for β-Ga2O3 and 4H-SiC,the bandgaps obtained by using hybrid functional calculations are 4.7 eV and 3.35 eV,which are in good agreement with the experimental values.For the β-Ga2O3/4H-SiC heterojunction interface,the interface exhibits semiconducting properties with a direct band gap of 0.46 eV.Meanwhile,the β-Ga2O3 and 4H-SiC form a type-II energy band alignment,and the calculated valence band offset is 1.72 eV and a conduction band offset is 0.18 eV.The obtained results are of great significance for the design of electronic devices based on β-Ga2O3 and 4H-SiC.

β-Ga2O3/4H-SiC heterojunctioninterface propertiesband alignmentfist-principles calculation

王佳琳、师俊杰、彭彦军、周泽民、周雄、桂庆忠、郭宇铮

展开 >

广西电网有限责任公司,广西南宁 530023

广西电网有限责任公司桂林供电局,广西桂林 541002

β-Ga2O3/4H-SiC异质结 界面性质 能带对齐 第一性原理计算

广西电网公司科技项目

GXKJXM20220095

2024

武汉大学学报(工学版)
武汉大学

武汉大学学报(工学版)

CSTPCD北大核心
影响因子:0.621
ISSN:1671-8844
年,卷(期):2024.57(2)
  • 21