Study on low temperature water bath synthesis of BiVO4 photocatalytic material for photodegradation of RhB under visible light
N-type semiconductor BiVO4 is one of the most promising visible-light-response photocatalytic materials for the degradation of organic pollutants.However,the photocatalyt-ic performance of pure BiVO4 is limited by the fast recombination of photogenerated electron-hole-pairs and slow carrier transmission rate.Surfactants can not only adjust the morphology and particle size of BiVO4,but also increase the active site of the reaction by increasing the specific surface area,and thus to improve the photocatalytic activity.In this study,a series of photocatalysts with different SDS/BiVO4 molar ratios were prepared by a simple one-step water bath method with sodium dodecyl sulfate(SDS)as the surfactant.The Rhodamine B was photodegraded by the resultant photocatalysts under the irradiation of 500 W Xenon lamp and their photocatalytic degradation performances were evaluated.The results show that 10％SDS/BiVO4 has the highest photocatalytic degradation efficiency.BET characteriza-tion and photocurrent test verify that the introduction of SDS not only increases the specific surface area of BiVO4 to provide more active sites to participate in the photocatalytic reac-tion,but also improves the efficiency of photogenerated carrier separation and migration.In addition,free radical trapping experiments show that·OH and h+were the main reactive groups in the photocatalytic degradation of Rhodamine B.The research method is green and easy to implement,which provides a new idea for the preparation of efficient visible light pho-tocatalyst for the degradation of organic pollutants.
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