稀有金属(英文版)2024,Vol.43Issue(1) :280-288.DOI:10.1007/s12598-023-02398-7

Ag-GST/HfOx-based unidirectional threshold switching selector with low leakage current and threshold voltage distribution for high-density cross-point arrays

Kyoung-Joung Yoo Dae-Yun Kang Nahyun Kim Ho-Jin Lee Ta-Hyeong Kim Taeho Kim Tae Geun Kim
稀有金属(英文版)2024,Vol.43Issue(1) :280-288.DOI:10.1007/s12598-023-02398-7

Ag-GST/HfOx-based unidirectional threshold switching selector with low leakage current and threshold voltage distribution for high-density cross-point arrays

Kyoung-Joung Yoo 1Dae-Yun Kang 1Nahyun Kim 1Ho-Jin Lee 1Ta-Hyeong Kim 1Taeho Kim 1Tae Geun Kim1
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作者信息

  • 1. School of Electrical Engineering,Korea University,Seoul 02841,Republic of Korea
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Abstract

The use of electrochemical-metallization-based volatile threshold switching selectors in cross-point arrays has been widely explored owing to their high on-off ratios and simple structure.However,these devices are unsuit-able for cross-point architectures because of the difficulty in controlling the random filament formation that results in large fluctuations in the threshold voltage during operation.In this study,we investigated the unidirectional threshold transition characteristics associated with an Ag/GST/HfOx/Pt-based bilayer selector and demonstrated the occurrence of a low leakage current(<1 × 10-11 A)and low distri-bution of the threshold voltage(△0.11 V).The bilayer structure could control the filament formation in the intermediate state through the insertion of an HfOx tun-neling barrier.By stacking a bilayer selector with NiOx-based resistive random-access memory,the leakage and programming currents of the device could be significantly decreased.For the crossbar array configuration,we per-formed equivalent circuit analysis of a one-selector one-resistor(1S1R)devices and estimated the optimal array size to demonstrate the applicability of the proposed structure.The maximum acceptable crossbar array size of the 1S1R device with the Ag/GST/HfOx/Pt/Ti/NiOx/Pt structure was 5.29 × 1014(N2,N=2.3 × 107).

Key words

Selector device/Tunneling barrier/Threshold switching/Sputtering/1S1R/Cross-point array

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基金项目

National Research Foundation of Korea(NRF)(2016R1A3B1908249)

出版年

2024
稀有金属(英文版)
中国有色金属学会

稀有金属(英文版)

CSTPCDCSCDEI
影响因子:0.801
ISSN:1001-0521
参考文献量30
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