印制电路信息2024,Vol.32Issue(9) :19-24.

中粗化微蚀药水引起化学镀镍/金不良的探讨

Discussion on ENIG poor deposit defect caused by roughening micro-etch chemical

唐小侠 徐卫祥 刘清
印制电路信息2024,Vol.32Issue(9) :19-24.

中粗化微蚀药水引起化学镀镍/金不良的探讨

Discussion on ENIG poor deposit defect caused by roughening micro-etch chemical

唐小侠 1徐卫祥 1刘清1
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作者信息

  • 1. 盐城维信电子有限公司,江苏盐城 224000
  • 折叠

摘要

中粗化微蚀药水可以增加铜面粗糙度,改善阻焊油墨等在铜面的附着力.但在使用中发现,某款中粗化微蚀药水后直接印刷阻焊油墨,存在化镍金沉积不良问题.通过讨论中粗化微蚀药水引起化镍金沉积不良问题的机理,并经过测试验证,确定了化镍金沉积不良问题的改善方案.

Abstract

Roughening micro-etch chemical treated copper surface gets higher roughness,hence improving the adhesion between copper surface and solder mask,etc.But electroless nickel/immersion gold(ENIG)poor deposit defect was detected,after some type roughening micro-etch chemical was used without post-treatment and directly followed by the solder mask process.This article discussed the mechanism for roughening micro-etch chemical resulting in ENIG poor deposit defect.And based on test results,improvement measures are provided to prevent the ENIG poor deposit defect.

关键词

中粗化微蚀药水/阻焊油墨/化镍金沉积不良

Key words

roughening micro-etch chemical/solder mask/electroless nickel/immersion gold(ENIG)poor deposit defect

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出版年

2024
印制电路信息
中国印制电路行业协会

印制电路信息

影响因子:0.243
ISSN:1009-0096
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