光刻机中承载晶圆进行图像曝光的硅片台是一个典型的多输入多输出(multi-input multi-output，MIMO)超精密运动系统，MIMO 前馈控制技术是抑制各自由度耦合误差的关键环节。针对光刻机粗微叠层式结构的硅片台，文中基于主从控制架构，提出一种微动台和粗动台 MIMO 前馈控制方法。该前馈采用线性参数化结构，以微分单元为基函数，将控制器的参数整定问题转化为一个凸优化问题，进而给出前馈控制器的全局最优参数整定方法以及参数迭代过程中梯度的无偏估计方法。通过硅片台多场曝光轨迹跟踪实验，验证所提参数整定方法的快速收敛性能。实验结果表明，所提方法能够有效减小微动台多自由度耦合的轨迹跟踪误差和粗微之间的相对误差。
Data-driven MIMO Feedforward Control for Ultra-precision Dual-stroke Wafer Stage
The wafer stage carrying silicon for image exposure in the lithography machine is a typical multi-input multi-output(MIMO)ultra-precision motion system.MIMO feedforward control technology is the critical link to suppress coupling errors of each degree of freedom.For the dual-stroke wafer stage with a short-stroke stage(SS)and a long-stroke stage(LoS),an MIMO feedforward strategy based on the master-slave control architecture is proposed.The feedforward adopts a linear parameterization structure and uses the differential unit as the basis function to convert the controller parameter tuning problem into a convex optimization problem.Furthermore,the global optimal parameter tuning method and the unbiased gradient estimation are given.Through multi-die exposure trajectory tracking experiments,the rapid convergence performance of the proposed parameter tuning method is verified.Experimental results demonstrate that the proposed method can effectively reduce the coupling trajectory tracking errors of SS and the relative errors between SS and LoS.
multi-input multi-output(MIMO)systemMIMO feedforwarddata-drivencontroller parameter tuningdual-stagewafer stageultra-precision motion system
万方数据
维普
