摘要
本文基于多源异构数据构建关键核心技术识别模型,通过对光刻技术论文、专利、新闻的收集与分析,依托LDA模型、结构洞理论和指标组合分析法,分别构建技术主题强度、技术等级度、技术价值度和技术价值稳定性四个指标来分别体现技术的成长性、创新性、价值性和稳定性,实现对光刻技术领域关键核心技术的识别.研究结果表明:从光刻技术领域的论文、专利和新闻中分别识别出 17、25 和32 种技术主题,通过指标组合分析得到光刻技术领域的 9 项关键核心技术:纳米芯片制造技术、薄膜热处理技术、EUV光刻技术、自组装扫描技术、半导体器件结构研究、扫描成像技术、光刻图形制备方法、光刻图像质量检测和掩膜光刻技术.最后,通过文献调研来评估模型识别结果,验证了模型的有效性,结论可为后续研究实践提供参考.
Abstract
This paper constructs a model for identifying key core technologies based on multi-source heterogeneous data.By collecting and analyzing papers,patents,and news on lithography technology,and relying on the LDA model,structural hole theory,and indi-cator combination analysis method,four indicators are constructed to reflect the growth,innovation,value,and stability of technology,namely,technology topic intensity,technology level degree,technology value degree,and technology value stability.This enables the identification of key core technologies in the field of lithography technology.The research results show that 17,25,and 32 technology topics are identified from papers,patents,and news in the field of lithography technology,respective-ly.Through indicator combination analysis,nine key core technologies in the field of lithography technology are identified as:nanochip manufacturing technology,thin film heat treatment technology,EUV lithography technology,self-assembly scanning technology,sem-iconductor device structure research,scanning imaging technology,lithography pattern preparation method,lithography image quality inspection,and mask lithography technology.Finally,the validity of the model is verified by literature research to evaluate the identifi-cation results of the model,and the conclusion can provide reference and learning for subsequent research.
NETL
NSTL
万方数据