Nano metal-oxygen cluster EUV photoresists and their performance influencing factors
With the development of the semiconductor industry,fabricating integrated circuits with higher density of electrical components is required to realize more advanced electronics technologies.In lithography technology,the size limitation of patterned feature structures is mainly determined by the wavelength of light radiation used to pattern a photoresist.In order to push the size of patterned feature structures to a smaller limit,the wavelength of light decreases more and more from ultraviolet to extreme ultraviolet.In recent years,extreme ultraviolet light(EUV)with a wavelength of 13.5 nm has become the light source for the new generation lithography technology.EUV lithography technology is a key technology for achieving sub-10 nm half-pitch node.Apart from the equipment such as light sources and lithography machines,the size of patterned structures is also constrained by photoresists.The critical properties of photoresist include resolution,sensitivity,line edge roughness(LER),and line width roughness(LWR).Up to now,many photoresists for EUV lithography have been developed,mainly including three categories such as polymer photoresists,molecular glass photoresists,and metal-based photoresists.Among them,the nano metal-oxygen cluster EUV photolithography colloid system with high sensitivity,high resolution,and low roughness due to its precise structure,small and uniform particle size,leads to its enormous application potential in EUV-based nanolithography.Overall,this review mainly introduces the composition and structural characteristics of nano metal-oxygen cluster EUV photoresists in recent years,as well as the factors affecting their performance.Multiple characterization methods are used to elucidate influence of photoresist composition,structure,and environmental factors on the photolithography process and pattern formation from the perspectives of resolution,sensitivity,and roughness.The photolithography mechanism and performance balance strategy are understood at multiple levels.
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