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基于灰度-高度映射的快速白光干涉在位测量

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为了提高微结构加工中的在位测量效率,本文提出一种基于白光干涉原理的微结构光学表面形貌快速在位测量方法.该方法仅采集特定轴向间隔的两幅干涉图像,进而通过所构建的灰度-高度映射关系实现微结构表面形貌的快速重建,避免了传统轴向扫描数据存储量大和效率低等不足.针对该方法,详细分析了影响测量精度的主要因素,证明了测量系统抵抗外部纳米振动的能力,确定了关键测量参数的最优取值范围.为验证新方法的有效性,基于超精密车床和白光干涉装置搭建了在位测量系统,结合子孔径拼接测量技术实现了典型微结构表面的大视场测量.实验结果表明,在位测量系统仅需采集16张干涉图像进行表面重建,传统扫描白光干涉方法则需要1024张,且两者测量面型均方根偏差为9.1367 nm,验证了所提出方法的高效性和精确性.
White light interference-based grayscale height mapping for fast on-machine measurement
The noncontact optical full-field on-machine measurement effectively identifies machining errors and improves machining efficiency in ultraprecision machining.In this study,a surface topography on-machine measurement method is developed for the microstructured optical components based on white light interference.The surface topography can be reconstructed using only two interferograms collected with a specific interval by establishing grayscale height mapping.Practically,taking a typical microstructured optical component as an example,the proposed method can significantly improve measurement efficiency while maintaining comparable accuracy to the scanning white light interferometry method.The resistance to nanoscale machine vibration has been verified by determining the influence of several parameters on the measurement results.Finally,the effectiveness of the proposed large-aperture on-machine measurement based on sub-aperture stitching is verified through experiments.

microstructuredon-machine measurementwhite light interferencesurface topography

孟定坤、朱志伟、黄鹏

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南京理工大学机械工程学院,南京 210094

微结构 在位测量 白光干涉 表面重建

2024

中国科学(技术科学)
中国科学院

中国科学(技术科学)

CSTPCD北大核心
影响因子:0.752
ISSN:1674-7259
年,卷(期):2024.54(11)