中国科学:信息科学(英文版)2024,Vol.67Issue(6) :148-167.DOI:10.1007/s11432-024-3986-8

Progress on the program of Si-compatible two-dimensional semiconductor materials and devices

Mingsheng XU Yuwei WANG Jiwei LIU Deren YANG
中国科学:信息科学(英文版)2024,Vol.67Issue(6) :148-167.DOI:10.1007/s11432-024-3986-8

Progress on the program of Si-compatible two-dimensional semiconductor materials and devices

Mingsheng XU 1Yuwei WANG 1Jiwei LIU 2Deren YANG3
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作者信息

  • 1. College of Integrated Circuits,State Key Laboratory of Silicon and Advanced Semiconductor Materials,Zhejiang University,Hangzhou 310027,China
  • 2. College of Integrated Circuits,State Key Laboratory of Silicon and Advanced Semiconductor Materials,Zhejiang University,Hangzhou 310027,China;School of Materials Science and Engineering,State Key Laboratory of Silicon and Advanced Semiconductor Materials,Zhejiang University,Hangzhou 310027,China
  • 3. School of Materials Science and Engineering,State Key Laboratory of Silicon and Advanced Semiconductor Materials,Zhejiang University,Hangzhou 310027,China
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Abstract

Two-dimensional(2D)materials are at the forefront of innovation,heralding a new era for next-generation electronics and optoelectronics.These materials are distinguished by their unique structural characteristics:they have no hanging bonds on their surface,exhibit weakened electrostatic shielding in the Z-direction,and boast atomic thickness in their monolayers.These features have led to groundbreaking discoveries in electrical,optical,and magnetic properties,paving the way for advancements in low-power electronics,valleytronics,infrared detectors,and memory devices.Despite these promising developments,Si-based technologies continue to dominate the landscape of next-generation electronics and optoelectronics,as well as heterogeneous integration.In response to this ongoing evolution,the National Natural Science Foundation of China(NSFC)initiated a major program in 2021 dubbed"Si-compatible two-dimensional semiconductor materials and devices".This study reviews the progress made under the NSFC Program,spotlighting its main achievements and outlining key future research directions.Additionally,it sheds light on the challenges that researchers in the 2D domain face,particularly in developing Si-compatible 2D tech-nologies.

Key words

two-dimensional materials/Si-based CMOS technologies/electronics and optoelectronics/het-erogeneous integration/low-power

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基金项目

National Natural Science Foundation of China(62090030/62090031)

National Natural Science Foundation of China(62274145)

Fund of China Scholarship Council(CSC)()

出版年

2024
中国科学:信息科学(英文版)
中国科学院

中国科学:信息科学(英文版)

CSTPCDEI
影响因子:0.715
ISSN:1674-733X
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